JPH0574900B2 - - Google Patents
Info
- Publication number
- JPH0574900B2 JPH0574900B2 JP61024482A JP2448286A JPH0574900B2 JP H0574900 B2 JPH0574900 B2 JP H0574900B2 JP 61024482 A JP61024482 A JP 61024482A JP 2448286 A JP2448286 A JP 2448286A JP H0574900 B2 JPH0574900 B2 JP H0574900B2
- Authority
- JP
- Japan
- Prior art keywords
- electron
- filament
- emitting surface
- electron emitting
- equipotential
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Electron Sources, Ion Sources (AREA)
- Electrodes For Cathode-Ray Tubes (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61024482A JPS62184742A (ja) | 1986-02-06 | 1986-02-06 | 電子銃 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61024482A JPS62184742A (ja) | 1986-02-06 | 1986-02-06 | 電子銃 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62184742A JPS62184742A (ja) | 1987-08-13 |
JPH0574900B2 true JPH0574900B2 (en]) | 1993-10-19 |
Family
ID=12139404
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61024482A Granted JPS62184742A (ja) | 1986-02-06 | 1986-02-06 | 電子銃 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62184742A (en]) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3427758A1 (en) * | 2014-03-21 | 2019-01-16 | Tetra Laval Holdings & Finance S.A. | Electron beam generator and electron beam sterilizing device |
-
1986
- 1986-02-06 JP JP61024482A patent/JPS62184742A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS62184742A (ja) | 1987-08-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4019077A (en) | Field emission electron gun | |
US4608513A (en) | Dual filament ion source with improved beam characteristics | |
US3783325A (en) | Field effect electron gun having at least a million emitting fibers per square centimeter | |
US8126118B2 (en) | X-ray tube and method of voltage supplying of an ion deflecting and collecting setup of an X-ray tube | |
US3701915A (en) | Electron beam gun | |
GB1357198A (en) | Method and devices for shaping resharpening or cleaning tips | |
JP7573601B2 (ja) | 電子源及びその製造方法、並びにエミッター及びこれを備える装置 | |
JP2956612B2 (ja) | フィールドエミッタアレイとその製造方法およびその駆動方法 | |
JP2607251B2 (ja) | 電界放射陰極 | |
JPH0574900B2 (en]) | ||
JPS6318297B2 (en]) | ||
US3775630A (en) | Electron gun device of field emission type | |
US4939425A (en) | Four-electrode ion source | |
US4596942A (en) | Field emission type electron gun | |
US4155028A (en) | Electrostatic deflection system for extending emitter life | |
US4910442A (en) | Field emission type electron gun | |
US4634925A (en) | Electron gun for a high power klystron | |
US3801854A (en) | Modulator circuit for high power linear beam tube | |
US3846663A (en) | Electron gun device having a field emission cathode tip protected from destruction due to ion impingement | |
JP2000504143A (ja) | 線状焦点電子ビームデバイスのための陰極アセンブリ | |
US4048534A (en) | Radial flow electron gun | |
JP7640787B2 (ja) | 電子源及びその製造方法、並びにエミッター及びこれを備える装置 | |
JP2550033B2 (ja) | 荷電粒子引き込み機構 | |
JPH01248446A (ja) | 電界放射形電子銃 | |
JPH0665200B2 (ja) | 高速原子線源装置 |